FSI International, Inc.
(972) 643-2000
600 Millenium Dr.
Allen, Texas,
USA
75013
fsi international inc., is a global supplier of surface conditioning equipment, technology and support services for microelectronics manufacturing. using the company's broad portfolio of cleaning products, which include batch and single-wafer platforms for immersion, spray, vapor and cryokinetic technologies, customers are able to achieve their process performance, flexibility and productivity goals.
Products & Services
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- Fsi International Inc.
- 130nm
- 90nm
- 65nm
- 200mm
- 300mm
- Allen
- Antares Cx Advanced
- Cleaning Systems
- Aries
- Back-end-of-line
- Baking
- Batch Processing Techniques
- Batch Spray
- Beol Strip
- Centrifugal Spray
- Chaska
- Cleaning
- Critical Cleaning
- Critical Etching
- Cryogenic
- Defect Removal
- Dio3 Ozone Generator
- Dispensing
- Etch
- Etching
- Excalibur 2000 Vapor Hf Etching System
- Exposure
- Feol Strip
- Front-end-of-line
- Immersion
- Japan
- Lithography
- Magellan Immersion Cleaning System
- Mercury Spray Processing Systems
- Mfsi
- Microlithography
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- Minnesota
- New Material Challenges
- Next-generation Design Rule Applications
- Oem
- Okayama
- Orion Dry Cleaning Module
- Nanostructure Formation
- Particle Reduction
- Photo-chemical
- Photolithography
- Photoresist
- Photosensitive Materials
- Polaris 2500 Microlithography Cluster
- Polaris 3500 Microlithography Cluster
- Pre-deposition
- Post-deposition
- Process Development
- Resist Processing
- Saturn/titan
- Semiconductor Equipment
- Silicon Wafers
- Single Wafer Spray
- Spray
- Stripping
- Texas
- Thin Film Head
- Vapor
- Wafer Cleaning
- Wafer Processing Technology
- Yieldup Rinse Dry Modules And Immersion Etch Systems
- Zeta Spray Processing Systems
- Mems
- Vapor Hf Processor
- Hf Etcher
- Dry Etch
- Dram
- Particle Removal
Web Result
- ZETA Spray Cleaning System...
- Contact Us | Suppliers | Employees | System Upgrades Find the Right Solution Products Wafer Size (mm) Applications FEOL Critical Clean & Etch FEOL All-Wet Resist Strip & Clean Silicide Metal Strip BEOL Strip & Clean Particle/Defect Removal Resist Processing ORION Single Wafer Cleaning System 300 ANTARES Single Wafer Cryokinetic System 200/ 300 ZETA Batch Spray System 200/ 300 ...
- Investors FAQ
- MERCURY Spray Cleaning...
- MERCURY MP Spray Cleaning...
- ANTARES
Website Links:
FSI International, Inc. | 2005 News Archive | 2006 News Archive | 2007 News Archive | 2008 News Archive | 2009 News Archive | 2010 News Archive | 2011 News Archive | 2012 News Archive | Annual Reports | ANTARES Single Wafer... | Application and Demo Lab | Backside Strip and Clean | BEOL Strip & Clean | BEOL Strip and Clean... | Corporate Backgrounder | Customer Training | Environmental Health & Safety | FEOL All-Wet Resist Strip... | FEOL Critical Clean & Etch
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