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• • Tribology
  • Cmp
  • Wafer Polishing
  • Cof
• • Wear
  • Hardness
  • Scratch Resistance

Web Result

CMP Process Development...

Home About Bruker About Bruker About the Founder Map & Directions News & Press Releases Conferences Products Nano & Micro Indentation and Scratch Tester Tribometers Universal Material Tester (UMT) Software Inline Imaging Chemical Mechanical Polisher and Cleaner Magnetic and Optical Disk-Head Interface Tests Applications ASTM Standard Tests Automotive & Aerospace Bio Materials Coati...

http://www.cetr.com/eng/services/notes-cmp-3.html

CMP Tester description

CMP Machine with Controlled Polishing for Process Development and Polishing Materials Functional Testing CMP process optimization and functional testing on consumables are expensive to perform on large production CMP machines. The novel bench-top CMP machine mod. CP-4 serves for efficient process development and testing of consumable materials, as well as planarization of MEMS wafers. The main ass...

http://www.cetr.com/Brochures/CMP_Machine_with_Controlled_Polishing.htm

Application Notes

Home About Bruker About Bruker About the Founder Map & Directions News & Press Releases Conferences Products Nano & Micro Indentation and Scratch Tester Tribometers Universal Material Tester (UMT) Software Inline Imaging Chemical Mechanical Polisher and Cleaner Magnetic and Optical Disk-Head Interface Tests Applications ASTM Standard Tests Automotive & Aerospace Bio Materials Coati...

http://www.cetr.com/eng/services/notes-probe-1.html

CETR Slurry Testing Pad Testing eCMP Wafer Polisher

Home About CETR About CETR About the Founder Map & Directions News & Press Releases Conferences Products Nano & Micro Indentation and Scratch Tester Tribometers Universal Material Tester (UMT) Software Inline Imaging Wafer Polisher and Cleaner Magnetic and Optical Disk-Head Interface Tests Applications ASTM Standard Tests Automotive & Aerospace Bio Materials Coating & Thin Film...

http://www.cetr.com/eng/services/polishing.html

CMP Process and Consumables...

CMP Process and Consumables Evaluation with PadProbe Jingxun Fang, Kenneth Davis, IBM, East Fishkill, NY12533 Norm Gitis, Michael Vinogradov, Center for Tribology, Campbell, CA 95008 Abstract The PadProbe with simultaneous real-time measurements of PadFriction and PadWear was used to evaluate a copper CMP process and consumables. During conditioning, PadFriction reaches its optimum level. Any fu...

http://www.cetr.com/Brochures/0403ICMI-PP.htm

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