fsi international inc., is a global supplier of surface conditioning equipment, technology and support services for microelectronics manufacturing. using the company's broad portfolio of cleaning products, which include batch and single-wafer platforms for immersion, spray, vapor and cryokinetic technologies, customers are able to achieve their process performance, flexibility and productivity goals.

Products & Services

• • Fsi International Inc.
  • 130nm
  • 90nm
  • 65nm
  • 200mm
  • 300mm
  • Allen
  • Antares Cx Advanced
  • Cleaning Systems
  • Aries
  • Back-end-of-line
  • Baking
  • Batch Processing Techniques
  • Batch Spray
  • Beol Strip
  • Centrifugal Spray
  • Chaska
  • Cleaning
  • Critical Cleaning
  • Critical Etching
  • Cryogenic
  • Defect Removal
  • Dio3 Ozone Generator
  • Dispensing
  • Etch
  • Etching
  • Excalibur 2000 Vapor Hf Etching System
  • Exposure
  • Feol Strip
  • Front-end-of-line
  • Immersion
  • Japan
  • Lithography
  • Magellan Immersion Cleaning System
  • Mercury Spray Processing Systems
  • Mfsi
  • Microlithography
• • Minnesota
  • New Material Challenges
  • Next-generation Design Rule Applications
  • Oem
  • Okayama
  • Orion Dry Cleaning Module
  • Nanostructure Formation
  • Particle Reduction
  • Photo-chemical
  • Photolithography
  • Photoresist
  • Photosensitive Materials
  • Polaris 2500 Microlithography Cluster
  • Polaris 3500 Microlithography Cluster
  • Pre-deposition
  • Post-deposition
  • Process Development
  • Resist Processing
  • Saturn/titan
  • Semiconductor Equipment
  • Silicon Wafers
  • Single Wafer Spray
  • Spray
  • Stripping
  • Texas
  • Thin Film Head
  • Vapor
  • Wafer Cleaning
  • Wafer Processing Technology
  • Yieldup Rinse Dry Modules And Immersion Etch Systems
  • Zeta Spray Processing Systems
  • Mems
  • Vapor Hf Processor
  • Hf Etcher
  • Dry Etch
  • Dram
  • Particle Removal

Web Result

Training Request Form

Contact Us | Suppliers | Employees | System Upgrades Find the Right Solution Products Wafer Size (mm) Applications FEOL Critical Clean & Etch FEOL All-Wet Resist Strip & Clean Silicide Metal Strip BEOL Strip & Clean Particle/Defect Removal Resist Processing ORION Single Wafer Cleaning System 300 ANTARES Single Wafer Cryokinetic System 200/ 300 ZETA Batch Spray System 200/ 300 ...

http://www.fsi-intl.com/index.php/support/training-request

Backside Strip and Clean

http://www.fsi-intl.com/index.php/applications-and-products/backside-strip-clean

ZETA Spray Cleaning System...

http://www.fsi-intl.com/index.php/support/training/257

Application Demo Lab

http://www.fsi-intl.com/index.php/application-demo-lab

Application and Demo Lab

http://www.fsi-intl.com/index.php/support/demolab

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